Domestic researchers have developed a nanoimprint device that will enhance the mass-production of nano elements.

A research team led by Dr. Lee Jae-jong at the Korea Institute of Machinery and Materials developed a new 30 nanometer technology to imprint patterns on nano elements.

The new technology enables quick and easy production of pattern nano elements, which will give significant help to the semiconductor and IT industries.

Until now, a technology of using electronic beams has been common to engrave patterns on nano elements, despite its high costs and slow-paced production.